The technology of electron beam lithography provides most modern and dynamic global industry - microelectronics.
Silicon is the base material for the production of microprocessors. It indicates the start of the silicon age of holography. Holograms created by this technology are recorded to a silicon substrate by a perfectly focused controlled electron beam. This presents a very sensitive instrument for recording the hologram structure, this is much finer that the laser beam.
The electron beam records the hologram structure which is engraved line after line, and the whole process of recording is controlled and operated by computer. Once generated an electron beam hologram not only covers all aspects of laser originated holography but it can contain far more complicated holographic design, in which we can precisely define visual and hidden features at any point within the hologram. These unique characteristics of holography generated by electron beam enables encoding of a large number of security features into the holographic structure.
Presently, we operate two technologies of electron beam lithography: MULTIMATRIX® and eˉDIRECT™ - the technology with the highest degree of protection.